Products&Services
Horizontal HVPE equipment is used for epitaxial growth of GaN thin films, Ga2O3 thin films, thick films and crystal growth on substrates such as sapphire and silicon carbide, as well as epitaxial growth of AlN.
Vertical HVPE equipment is used for epitaxial growth of GaN thin films, Ga2O3 thin films, thick films and crystal growth on substrates such as sapphire and silicon carbide, as well as epitaxial growth of AlN.
Mainly used for 2-6 inch AlN crystal growth
High temperature resistance/induction heater, optimized thermal field design, multi temperature zone graphite crucible, lifting, pulling, equal diameter control, etc.
Putting customers first, employees first, quality first, innovation as the soul, strict love and mutual assistance within and outside the circle
Address: West Airport Industrial Park, Shuangyuan Road, Chengyang District, Qingdao City
TEL:4008-110044
E-mail:huaqitech@163.com
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